JPH051626B2 - - Google Patents
Info
- Publication number
- JPH051626B2 JPH051626B2 JP60021813A JP2181385A JPH051626B2 JP H051626 B2 JPH051626 B2 JP H051626B2 JP 60021813 A JP60021813 A JP 60021813A JP 2181385 A JP2181385 A JP 2181385A JP H051626 B2 JPH051626 B2 JP H051626B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- drain
- mos transistor
- well region
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/101—Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
- H10D84/141—VDMOS having built-in components
- H10D84/148—VDMOS having built-in components the built-in components being breakdown diodes, e.g. Zener diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/393—Body regions of DMOS transistors or IGBTs
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60021813A JPS61182264A (ja) | 1985-02-08 | 1985-02-08 | 縦型mosトランジスタ |
US06/826,772 US4819044A (en) | 1985-02-08 | 1986-02-06 | Vertical type MOS transistor and its chip |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60021813A JPS61182264A (ja) | 1985-02-08 | 1985-02-08 | 縦型mosトランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61182264A JPS61182264A (ja) | 1986-08-14 |
JPH051626B2 true JPH051626B2 (en]) | 1993-01-08 |
Family
ID=12065498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60021813A Granted JPS61182264A (ja) | 1985-02-08 | 1985-02-08 | 縦型mosトランジスタ |
Country Status (2)
Country | Link |
---|---|
US (1) | US4819044A (en]) |
JP (1) | JPS61182264A (en]) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05246301A (ja) * | 1992-03-06 | 1993-09-24 | Toyota Motor Corp | エアバッグ装置用衝突センサの配置構造 |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4929991A (en) * | 1987-11-12 | 1990-05-29 | Siliconix Incorporated | Rugged lateral DMOS transistor structure |
JPH01215067A (ja) * | 1988-02-24 | 1989-08-29 | Hitachi Ltd | 縦型絶縁ゲート電解効果トランジスタ |
JPH0817234B2 (ja) * | 1988-07-20 | 1996-02-21 | 富士電機株式会社 | 半導体集積回路 |
FR2649828B1 (fr) * | 1989-07-17 | 1991-10-31 | Sgs Thomson Microelectronics | Circuit integre vdmos/logique comprenant un transistor vertical deplete et une diode zener |
EP0416805B1 (en) * | 1989-08-30 | 1996-11-20 | Siliconix, Inc. | Transistor with voltage clamp |
JP2701502B2 (ja) * | 1990-01-25 | 1998-01-21 | 日産自動車株式会社 | 半導体装置 |
JP2692350B2 (ja) * | 1990-04-02 | 1997-12-17 | 富士電機株式会社 | Mos型半導体素子 |
US5404040A (en) * | 1990-12-21 | 1995-04-04 | Siliconix Incorporated | Structure and fabrication of power MOSFETs, including termination structures |
US5304831A (en) * | 1990-12-21 | 1994-04-19 | Siliconix Incorporated | Low on-resistance power MOS technology |
JP2579702B2 (ja) * | 1991-02-08 | 1997-02-12 | 株式会社 神戸製鋼所 | ホイールクレーン |
GB9207849D0 (en) * | 1992-04-09 | 1992-05-27 | Philips Electronics Uk Ltd | A semiconductor device |
US5430314A (en) | 1992-04-23 | 1995-07-04 | Siliconix Incorporated | Power device with buffered gate shield region |
US5701071A (en) * | 1995-08-21 | 1997-12-23 | Fujitsu Limited | Systems for controlling power consumption in integrated circuits |
US6747315B1 (en) * | 1999-07-15 | 2004-06-08 | Rohm Co., Ltd. | Semiconductor device having MOS field-effect transistor |
DE10217610B4 (de) * | 2002-04-19 | 2005-11-03 | Infineon Technologies Ag | Metall-Halbleiter-Kontakt, Halbleiterbauelement, integrierte Schaltungsanordnung und Verfahren |
DE10262169B4 (de) * | 2002-04-19 | 2016-11-03 | Infineon Technologies Ag | Halbleiterbauelement und integrierte Schaltungsanordnung damit |
JP4272854B2 (ja) * | 2002-07-10 | 2009-06-03 | キヤノン株式会社 | 半導体装置及びそれを用いた液体吐出装置 |
JP4202970B2 (ja) * | 2004-06-10 | 2008-12-24 | 株式会社東芝 | 半導体装置及びその製造方法、半導体装置の欠陥検出方法 |
KR100648276B1 (ko) | 2004-12-15 | 2006-11-23 | 삼성전자주식회사 | 역방향 다이오드가 구비된 수직형 디모스 소자 |
US9484451B2 (en) * | 2007-10-05 | 2016-11-01 | Vishay-Siliconix | MOSFET active area and edge termination area charge balance |
US9431249B2 (en) | 2011-12-01 | 2016-08-30 | Vishay-Siliconix | Edge termination for super junction MOSFET devices |
US9614043B2 (en) | 2012-02-09 | 2017-04-04 | Vishay-Siliconix | MOSFET termination trench |
US9842911B2 (en) | 2012-05-30 | 2017-12-12 | Vishay-Siliconix | Adaptive charge balanced edge termination |
US9508596B2 (en) | 2014-06-20 | 2016-11-29 | Vishay-Siliconix | Processes used in fabricating a metal-insulator-semiconductor field effect transistor |
US9887259B2 (en) | 2014-06-23 | 2018-02-06 | Vishay-Siliconix | Modulated super junction power MOSFET devices |
CN106575666B (zh) | 2014-08-19 | 2021-08-06 | 维西埃-硅化物公司 | 超结金属氧化物半导体场效应晶体管 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2916114A1 (de) * | 1978-04-21 | 1979-10-31 | Hitachi Ltd | Halbleitervorrichtung |
DE3012185A1 (de) * | 1980-03-28 | 1981-10-08 | Siemens AG, 1000 Berlin und 8000 München | Feldeffekttransistor |
US4345265A (en) * | 1980-04-14 | 1982-08-17 | Supertex, Inc. | MOS Power transistor with improved high-voltage capability |
US4399449A (en) * | 1980-11-17 | 1983-08-16 | International Rectifier Corporation | Composite metal and polysilicon field plate structure for high voltage semiconductor devices |
JPS57206073A (en) * | 1981-06-12 | 1982-12-17 | Hitachi Ltd | Mis semiconductor device |
US4532534A (en) * | 1982-09-07 | 1985-07-30 | Rca Corporation | MOSFET with perimeter channel |
JPS5998557A (ja) * | 1982-11-27 | 1984-06-06 | Nissan Motor Co Ltd | Mosトランジスタ |
JPS59149056A (ja) * | 1983-02-15 | 1984-08-25 | Nissan Motor Co Ltd | 縦型mosトランジスタ |
JPS59231862A (ja) * | 1983-06-13 | 1984-12-26 | Nissan Motor Co Ltd | 縦型mosトランジスタ |
US4631564A (en) * | 1984-10-23 | 1986-12-23 | Rca Corporation | Gate shield structure for power MOS device |
-
1985
- 1985-02-08 JP JP60021813A patent/JPS61182264A/ja active Granted
-
1986
- 1986-02-06 US US06/826,772 patent/US4819044A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05246301A (ja) * | 1992-03-06 | 1993-09-24 | Toyota Motor Corp | エアバッグ装置用衝突センサの配置構造 |
Also Published As
Publication number | Publication date |
---|---|
JPS61182264A (ja) | 1986-08-14 |
US4819044A (en) | 1989-04-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |